A first principle study on atomic layer deposition mechanism: Case study of aluminum thin films on c

来源 :The 9th International Conference on Thin Film Physics and Ap | 被引量 : 0次 | 上传用户：shushuclover1

【摘要】

：

　　Theoretical study on deposition mechanism of aluminum and iridium thin films by atomic layer deposition method was carried out by density functional method.

【作者】

：

YuqingXiong;

【机构】

：

Lanzhou Institute of Physics, CAST,China

【出处】

：

The 9th International Conference on Thin Film Physics and Ap

【发表日期】

：

2016年期

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　　Theoretical study on deposition mechanism of aluminum and iridium thin films by atomic layer deposition method was carried out by density functional method.For special applications,we aimed to deposit aluminum thin films by atomic layer deposition, on cyanate ester and epoxy composite substrate, respectively.

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A first principle study on atomic layer deposition mechanism: Case study of aluminum thin films on c

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