论文部分内容阅读
二氧化钛是一种优良的光学镀膜材料,但在真空镀膜过程中,经电子轰击后易分解、氧化成各种低价氧化钛,致使难于控制蒸发工艺条件。使用低价氧化铁(TiO、Ti_2O_3、Ti_3O_5)作为原料,在氧气氛下镀膜,不但蒸发条件易于控制,且能得到均匀、致密、性能优异的薄膜。因此目前已广泛采用低价氧化钛作为光学镀膜材料。
Titanium dioxide is an excellent optical coating material, but in the vacuum coating process, after electron bombardment easy decomposition, oxidation into a variety of low-cost titanium dioxide, making it difficult to control the evaporation process conditions. The use of low-cost iron oxide (TiO, Ti_2O_3, Ti_3O_5) as raw materials, coating in oxygen atmosphere, not only the evaporation conditions easy to control, and can be uniform, dense, excellent performance of the film. Therefore, low-cost titanium oxide has been widely used as an optical coating material.