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Detection of Defects in Epitaxial Graphene on SiC through Anisotropic Hydrogen Plasma Etching
【作 者】
:
【机 构】
:
Research&DevelopmentCenterforFunctionalCrystals,BeijingNationalLaboratoryforCondensedMatterPhysics,I
【出 处】
:
The 4th International Conference of Recent Progress in Graph
【发表日期】
:
2012年10期
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