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Homogenous TiO2-SiO2 Ultra-Low-Expansion Glass Evaluated by the Line-Focus-Beam Ultrasonic Material
【机 构】
:
Tohoku University, Electrical Engineering,Sendai, Japan
【出 处】
:
2008 IEEE International Ultrasonics Symposium(IUS)(2008 IEEE
【发表日期】
:
2008年1期
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