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Y2O3 films were epitaxial grown on biaxially textured Ni-5at.%W substrate by direct-current (DC) magnetron reactive sputtering using dynamic reel-to-reel system.Detailed deposition conditions of Y2O3 seed layers were studied.The best samples deposited on optimization condition showed pure c-axis orientation.Full width at half maximum (FWHM) values of in-plane and out-of-plane for Y2O3 films were 4.3° and 3.5°, respectively.Atomic force microscope (AFM) reveals smooth surface with Root-mean-square roughness (RMS) lower than 5nm.High textured YBCO film、 YSZ barrier layers and CeO2 cap layers were deposited on Y2O3 seed layers using DC sputtering.The critical current density (Jc) of YBCO film on CeO2/YSZ/Y2O3 buffered Ni-W tapes was 1.3MA/cm2.