Research on Key Technologies of Wafer Stage of Lithography

来源 :第八届工业与应用数学国际大会 | 被引量 : 0次 | 上传用户：luodks

【摘要】

：

　　Nanometer-level synchronized movement accuracy is the key factor to guarantee the pattern transfer with high fidelity for wafer stage of lithographic tool.

【作者】

：

Zhu Yu

【机构】

：

Department of Mechanical Engineering,Tsinghua Univ.

【出处】

：

第八届工业与应用数学国际大会

【发表日期】

：

2015年期

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　　Nanometer-level synchronized movement accuracy is the key factor to guarantee the pattern transfer with high fidelity for wafer stage of lithographic tool.

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Research on Key Technologies of Wafer Stage of Lithography

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