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5. Polycrystalline silicon texturing by dual-frequency excited capacitively coupled plasma

Polycrystalline silicon texturing by dual-frequency excited capacitively coupled plasma

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：ZGGILOVE

【摘 要】

：

Hologen-based reactive plasma is widely viewed as a promising technique for high effective texturing of polycrystalline silicon in solar cell field.

【作 者】

：

Shuai Zou Liangliang Ji Zhonghua Tang Xiaodong Su Yu Xin 

【机 构】

：

Provincial Key Lab of Thin Films, School of Physical Science and Technology, Soochow University, Chi

【出 处】

：

2011年第三届微电子及等离子体技术国际会议

【发表日期】

：

2011年9期

【关键词】

：

Plasma texturing polycrystalline silicon Solar cell Reflection 

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Hologen-based reactive plasma is widely viewed as a promising technique for high effective texturing of polycrystalline silicon in solar cell field.

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