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TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique.It has been found that the sputtering pressure is a very important parameter for the structure of the deposited TiO2 films.When the pressure is lower than 1 Pa, the deposited has a dense structure and shows a preferred orientation along the (101) direction.However, the nanorod structure has been obtained as the sputtering pressure is higher than 1 Pa.These nanorods structure TiO2 film shows a preferred orientation along the (220) direction.