Feature-scale Simulations of Particulate Slurry Flows in Chemical Mechanical Polishing by SPH

来源 :第八届工业与应用数学国际大会 | 被引量 : 0次 | 上传用户：king_8

【摘要】

：

　　In this talk,the mechanisms of material removal in chemical mechanical polishing in the very large scale integration(VLSI)process are investigated by the sm

【作者】

：

Shao Sihong Yan Changhao Cai Wei

【机构】

：

Peking Univ.

【出处】

：

第八届工业与应用数学国际大会

【发表日期】

：

2015年期

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　　In this talk,the mechanisms of material removal in chemical mechanical polishing in the very large scale integration(VLSI)process are investigated by the smoothed particle hydrodynamics(SPH)method.

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Feature-scale Simulations of Particulate Slurry Flows in Chemical Mechanical Polishing by SPH

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