Nowadays more and more vacuum equipments were used in laboratory and factory due to they can introduce less impurity materials with high quality and make the film more stable.1 Magnetron sputtering is one of the most common equipment, which can fabricate many kinds of film including magnetic and non-magnetic materials, and the targets can be made by any droping ratio using different materials.2,3 The low-dimension materials are the materials at least in one direction due to the scale effects of changes in the nature of a class of materials including nano line, nano tube, quantum well, quantum dot and so on, which have some properties the bulk materials do not have.