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SrRuO3 thin films are grown on SrTiO3 (001) by pulsed laser deposition (PLD) at different substrate temperature:650 ℃ (F1) and 750 ℃ (F2).The X-Ray diffraction (XRD) and X-Ray reflectivity (XRR) measurements were carried out at BL1B beamline at Shanghai Synchrotron Radiation Facility (SSRF) with wavelength of 1.2398 (A).The XRR simulation indicates that a Ti2O3 interface layer is developed between the SrTiO3 (STO) substrate and SrRuO3 (SRO).In the meanwhile,film F1 and film F2 could be treated as multiple layers as RuO2-SrRuO3-RuO2 and SrRuO3-SrRuO3-SrRuO3,respectively.