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5. Interfacial Diffusion of TiN/LaN/AlN/HfO2/Si Stacks with Dual Capping Layers and Electrical Properti

Interfacial Diffusion of TiN/LaN/AlN/HfO2/Si Stacks with Dual Capping Layers and Electrical Properti

来源 :The 17th International Conference on Surface Modification of | 被引量 : 0次 | 上传用户：zhxg1030

【作 者】

：

A.P.Huang X.H.Zheng Z.S.Xiao 

【机 构】

：

Department of Physics, Beihang University, Beijing 100191, China

【出 处】

：

The 17th International Conference on Surface Modification of

【发表日期】

：

2011年3期

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