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With the development of semiconductor technology,the 10 nm feature size is approaching.
DYNAMIC IN-SITU ELECTRON MICROSCOPY OF SUB-10NM MATERIALS
【摘 要】
：
With the development of semiconductor technology,the 10 nm feature size is approaching.
【机 构】
：
SEU-FEINano-PicoCenter,KeyLaboratoryofMEMSofMinistryofEducation,CollaborativeInnovationCenterforMicr
【出 处】
：
第十六届北京分析测试学术报告会
【发表日期】
：
2015年10期
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