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采用硅-玻璃键合和选择性腐蚀技术研制出了玻璃上硅(SOG)光波导材料。所研制出的光波导材料表面质量主要取决于所用绝缘体上硅(SO I)材料。当所用SO I材料为基于SIMOX技术的材料时,表面RM S粗糙度为3nm左右,自相关长度为100nm左右。采用SOG材料所制作出的脊型光波导的传输损耗与相应的SO I材料上制作出的光波导相当。这种光波导材料既具有SO I材料的众多优点,还可以在器件制作中同时实施硅的下界面处理,同时它采用玻璃作为波导的下限制层,得到较厚的下限制层。
Silicon-on-glass (SOG) optical waveguide materials have been developed using silicon-glass bonding and selective etching techniques. The surface quality of optical waveguide materials developed depends mainly on the silicon-on-insulator (SOI) material used. When the SO I material used is a SIMOX technology-based material, the roughness of the surface RM S is about 3 nm, and the autocorrelation length is about 100 nm. The ridge type optical waveguides manufactured using SOG materials have a transmission loss equivalent to the optical waveguides produced on the corresponding SOI materials. This optical waveguide material offers numerous benefits of SOI materials, as well as simultaneous silicon under-interface processing in device fabrication while using glass as the lower confinement layer of the waveguide to achieve thicker lower confinement layers.