Meter-Scale Plasma Production and Thin Film Deposition Process with Parallel Waveguide at 915 MHz Mi

来源 :9th Asia-Pacific Conference on Plasma Science and Technology | 被引量 : 0次 | 上传用户:liongliong567
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The Si3N4 nanopowder was prepared by means of ICPECVD by decomposing of Sill4 and N2.The ion density in the reaction chamber was diagnosed by a Langrnuir probe.Analysis by FT-IR, TEM and XRD reveals t
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