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CVD is the most popular method to prepare large-scale and highly uniform graphene films on metal substrates.However, the atomic scale structure, the stacking order, as well as the defect states was seldom reported due to the corrugated nature of the polycrystalline metal substrates.We tried to address this issue by using Rh foils and Rh(111) as substrates, and explore the different growth behaviors mainly by virtue of STM characterizations.