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Novel High-RI Resists for 193 nm Immersion Lithograph
【机 构】
：
Centre for Magnetic Resonance & Australian Institute of Bioengineering and Nanotechnology University
【出 处】
：
第四届光响应有机和高分子材料国际会议(4th International Conference on Photoresp
【发表日期】
：
2008年1期
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