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  5. Synthesis and characterization of composition spread Ti-Si-N nano-composite thin films

Synthesis and characterization of composition spread Ti-Si-N nano-composite thin films

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：fengfang66
【摘 要】
：
A Mask Confined Continuous Composition Spread (MCCCS) technique was developed for high-throughput thin film materials synthesis and optimization.
【作 者】
：
Feng Sun Wen-qi Lu Wan-yu Ding Jun Xu 
【机 构】
：
Key Laboratory of Materials Modification by Laser, Ion and Electron Beams(Dalian University of Techn
【出 处】
：
2011年第三届微电子及等离子体技术国际会议
【发表日期】
：
2011年9期
【关键词】
：
Ti-Si-N thin film magnetron sputtering continuous composition spread hardness ep 
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A Mask Confined Continuous Composition Spread (MCCCS) technique was developed for high-throughput thin film materials synthesis and optimization.
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