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  5. Nanoindentation and Nanoscratch Behaviors of TiN Film Fabricated by Plasma Immersion Ion Implantatio

Nanoindentation and Nanoscratch Behaviors of TiN Film Fabricated by Plasma Immersion Ion Implantatio

来源 :The 8th Asian-European International Conference on Plasma Su | 被引量 : 0次 | 上传用户：sorry314
【作 者】
：
Yunying Fan Hongxi Liu Qian Xu Yehua Jiang 
【机 构】
：
Faculty of Materials Science and Engineering,Kunming University of Science and Technology,Kunming 65
【出 处】
：
The 8th Asian-European International Conference on Plasma Su
【发表日期】
：
2011年1期
【关键词】
：
Plasma Immersion Ion Implantation and Deposition (PIIID) Nano-indentation nano-s 
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