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The plasma density reached 3.2×1015m-3,whilemaintaining electron temperature of aroundat a pressure of 120 Pa with a discharge gap of 10mm.The measured sheath potential was lower than the theoretical values, suggesting the existence of negative ions.To sum up,it is concluded that the developed VHF plasma source in this study provides a uniform. largearea and high density plasma That is suitable for the fabrication of high quality thin films.