Fine pattern formation on silicate glasses under DC voltage application

来源 :The 24th International Conference on Glass( ICG Congress 201 | 被引量 : 0次 | 上传用户：houguangyun1981

【摘要】

：

【作者】

：

J.Nishii T.Misawa M.Takei S.Ikeda T.Suzuki K.Uraji K.Yamamoto

【机构】

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Research Institute for Electronic Science, Hokkaido University, N20 W10, Kita-ku, Sapporo 001-0020,

【出处】

：

The 24th International Conference on Glass( ICG Congress 201

【发表日期】

：

2016年11期

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Cation migration according to a voltage gradient can be applicable to the fine pattern formation on glasses below their glass transition temperature (Tg), which is called as "electrical nanoimprint (ENI)".This paper reports the relationship between the cation diffusion characteristics and the fine structure formation using the ENI.

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Fine pattern formation on silicate glasses under DC voltage application

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