Macroparticles (MPs) reduction is the main subject in the process of arc ion plating and there are many process parameters affect the MPs distribution on the resultant films.However,the effects of process parameters on MPs reduction were often researched individually.In this study,TiN films were prepared by axisymmetric magnetic filed (AMF) enhanced arc ion plating (ALP) under different process parameters including magnetic filed intensity,bias voltage,nitrogen content,sample position.The morphology,particle size distribution and area fraction of MPs on the resultant TiN films were systematically investigated and compared.The mechanisms of MPs reduction under different process parameters were discussed in detail.The magnetic filed intensity is the decisive parameter which affects the cathode spot velocity and the MPs generation.At low AMF,the bias voltage and the nitrogen content have an important influence on the MPs reduction.With increasing the AMF intensity,the effects of other parameters on the MPs reduction decrease gradually.When the AMF intensity increases over the critical value,other parameters have no much effect on the MPs reduction.This paper provides a thorough understanding of the MPs reduction and gives a better controlling approach.