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Jung A.CHOI,Mingyu KANG,Ho-Nyun LEE,Kwan Hyun CHO,Heui Seok KANG and Kyung Tae KANG (Korea Institute of Industrial Technology) Plasma enhanced chemical vapor deposition technology has been used in fabrication of thin films for semiconductor and flat panel display industry.However its limitation in formation of effective inorganic barrier films using low-temperature processes has become an important issue in the field of flexible electronics.