【摘 要】
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This study prepared Mo sputtering targets with different microstructures and textures through using several metallurgical processes.The effects of microstructure and texture on the sputtering properti
【机 构】
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New Materials Research & Development Department,China Steel Corporation,Kaohsiung 81233,Taiwan,Repub
【出 处】
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2013年全国粉末冶金学术会议及海峡两岸粉末冶金技术研讨会
论文部分内容阅读
This study prepared Mo sputtering targets with different microstructures and textures through using several metallurgical processes.The effects of microstructure and texture on the sputtering properties of Mo target were investigated.The experimental results showed that a fully dense,fine-grained and randomly orientated Mo target exhibiting the highest deposition rate was obtained by hot isostatic pressing process.However,the electrical resistivity of the deposited Mo films was high due to the high oxygen content in the Mo target.Mo only reached 97％ density by hydrogen sintering.The density could reach 100％ through the further rolling process,but the deposition rate obviously decreased after the plastic working.Although annealing treatment after rolling could change the microstructure from deformed to recrystallized and thus improve the deposition rate,the value was still lower than that of the sintering.This is possibly attributed to the texture transformation from random to intensely (100) orientated.
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