Measurement Uncertainty Analysis of nanometer scale film Thickness by X-ray Reflectometry

来源 :International Conference on Nanoscience & Technology,China 2 | 被引量 : 0次 | 上传用户:jjJJ012689
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  To realize the nanometer scale thin film thickness traceable measurement, the calibration method of monolayer thickness is studied.In this method the calibrated x-ray diffraction System is used as measurement standard set-up which can be traced to SI units.Firstly, it is based on the theory of the grazing incidence X-ray reflectivity, to analysis peak positions in the measured X-ray reflection intensity curve and the scanning range is from incident angle 0=0.02 ~0.2° to 2~6°.
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