Improvement of Film Thickness Uniformity in Meniscus Coating

来源 :The 4th Advances in Optoelectronics and Micro/nano-optics (A | 被引量 : 0次 | 上传用户：forest_28

【摘要】

：

【作者】

：

Jiping Lin Zhengkun Liu Xiaolong Jiang Qingbo Wang Huoyao Chen Yilin Hong Shaojun Fu

【机构】

：

National Synchrotron Radiation Laboratory,University of Science and Technology of China

【出处】

：

The 4th Advances in Optoelectronics and Micro/nano-optics (A

【发表日期】

：

2014年5期

【关键词】

：

meniscus coating uniformity photoresist

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　　In order to realize the uniform coating of photoresist on large area substrates,which could hardly been attained by other methods like spin coat-ing,a slotted meniscus coating applicator has been designed and assembled in this paper.During the coating process,the photoresist is continuously andslowly pumped out through a long and narrow slot like a fountain in the shape of meniscus.

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Improvement of Film Thickness Uniformity in Meniscus Coating

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