【摘 要】
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We have investigated degradation of co-evaporated CH3NH3PbI3 films using X-ray photoelectron spectroscopy (XPS), small angle x-ray diffraction (XRD), and atomic force microscopy (AFM).The CH3NH3PbI3 f
【机 构】
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Hunan Key Laboratory for Super-microstructure and Ultrafast Process,School of Physics and Electronic
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We have investigated degradation of co-evaporated CH3NH3PbI3 films using X-ray photoelectron spectroscopy (XPS), small angle x-ray diffraction (XRD), and atomic force microscopy (AFM).The CH3NH3PbI3 films have an excellent atomic ratio and crystal structure.The films were exposed to oxygen, air and water, respectively.The results indicate that CH3NH3PbI3 film is not sensitive to oxygen.Even after 1012L of oxygen exposure, no O signal can be detected on the surface.
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