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采用能产生高密度等离子体的磁控弧光放电增强等离子体离子镀的方法，制备立方氮化硼（ｃ－ＢＮ）薄膜．
A cubic boron nitride (c-BN) thin film was prepared by magnetron arc discharge enhanced plasma ion plating which can produce high-density plasma.