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Ti-containing carbon films were deposited by using magnetron sputtering deposition.The composition and microstructure of the carbon films were characterized in detail by combining the techniques of Rutherford backscattering spectrometry (RBS),X-ray photoelectron spectroscopy (XPS),X-ray diffraction (XRD) and transmission electron microscopy (TEM).It is found that carbon films contain Ti 18 at pct;after Ti incorpo- ration,the films consist of titanium carbide;Cls peak appears at 283.4 eV and it could be divided into 283.29 and 284.55 eV,representing sp~2 and sp~3,respectively,and sp~2 is superior to sp~3.This Ti-containing film with dominating sp~2 bonds is nanocornposites with nanocrystalline TiC clusters embedded in an amorphous carbon matrix,which could be proved by XRD and TEM.
Ti-containing carbon films were deposited by using magnetron sputtering deposition. Composition and microstructure of the carbon films were characterized in detail by combining the techniques of Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) and transmission electron microscopy (TEM) .It is found that carbon films contain Ti 18 at pct; after Ti incorporation, the films consist of titanium carbide; Cls peak appears at 283.4 eV and it could be divided into 283.29 and 284.55 eV, representing sp ~ 2 and sp ~ 3, respectively, and sp ~ 2 is superior to sp ~ 3.This Ti-containing film with dominating sp ~ 2 bonds is nanocornposites with nanocrystalline TiC clusters embedded in an amorphous carbon matrix, which could be proved by XRD and TEM.