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将硼加入Ti－N涂层，使用活化离子镀制备出了硼含量为（5～16）at％的Ti－B－N涂层，并着重研究了硼含量对Ti－B－N涂层结构与性能的影响。EPMA与AES分析表明，Ti－B－N涂层元素Ti、B、N在涂层内分布均匀，但在膜／基界面处有一界面扩散区。TEM显微分析表明，Ti－B－N涂层为致密微细的纳米晶多相复合结构，晶粒度不超过50nm。XRD与XPS综合分析表明，Ti－B－N涂层主要由面心立方TIN、简单正交TiB、立方BN与简单六方Ti－B－N相组成，且随着硼含量的增加，含硼相含量增加。Ti－B－N涂层的硬度、韧性与附着强度等力学性能比相应的Ti－N涂层要好得多，且其沉积温度更低。
Ti-B-N coating with boron content of (5-16) at% was prepared by adding boron to the Ti-N coating. The effect of boron content on the Ti-B-N coating structure And the impact of performance. EPMA and AES analysis showed that the Ti-B-N coating elements Ti, B, N were uniformly distributed in the coating, but there was an interface diffusion zone at the film / base interface. TEM micrographs show that the Ti-B-N coating is a dense and fine nanocrystalline multiphase composite structure with grain size not exceeding 50nm. The results of XRD and XPS show that the Ti-B-N coating mainly consists of face-centered cubic TIN, simple orthogonal TiB, cubic BN and simple hexagonal Ti-B-N phase. With the increase of boron content, Increased content. Ti-B-N coating hardness, toughness and adhesion strength and other mechanical properties than the corresponding Ti-N coating is much better, and the deposition temperature is lower.