The Effects of Chemical (isotropic) and Anisotropic Etching Processes on the Roughening of Nanocompo

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Simulation results of roughening of nanocomposite materials during both isotropicand anisotropic etching processes based on the level set method are presented.It is clearly shownthat the presence of two phases with different etching rates affects the development of surfaceroughness and that some roughness characteristics obey simple scaling laws.In addition,certainscaling laws that describe the time dependence of the root mean square (rms) roughnessw for various etching processes and different characteristics of the nanocomposite materials aredetermined. Simulation results of roughening of nanocomposite materials during both isotropic and anisotropic etching processes based on the level set method are presented. It is clearly shownthat the presence of two phases with different etching rates affects the development of surfaceroughness and that some of the characteristics of obey simple scaling laws. In addition, certainscaling laws that describe the time dependence of the root mean square (rms) roughnessw for various etching processes and different characteristics of the nanocomposite materials aredetermined.
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