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用单槽脉冲电沉积法在含CuSO4、NiSO4和Na3C6H5O7的镀液中制备了不同调制波长的Cu/Ni纳米多层膜,对其进行了截面形貌观察及显微硬度测量。结果表明,制备的多层膜平整,层间界清晰。其显微硬度在调制波长为100nm时出现峰值。当调制波长大于100nm时,多层膜显微硬度的变化符合Hall-Petch关系;当调制波长小于100nm时,显微硬度开始下降。X射线衍射表明,膜层中存在压应力,Ni层形成了强(100)织构。
Cu / Ni nano-multilayer films with different modulation wavelength were prepared by single-cell pulse electrodeposition method in CuSO4, NiSO4 and Na3C6H5O7. The cross-section morphologies and microhardness were measured. The results show that the prepared multilayer film is flat and the interlayer boundary is clear. Its microhardness peaked at a modulation wavelength of 100 nm. When the modulation wavelength is greater than 100nm, the multilayer microhardness changes in line with the Hall-Petch relationship; when the modulation wavelength is less than 100nm, microhardness began to decline. X-ray diffraction showed that there was compressive stress in the film and the Ni layer formed a strong (100) texture.