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本文分析了电子束曝光制作全息图的各种误差,提出了一种扫描矩形光栅来测量误差的方法,并通过设置误差修正程序来加以修正。最后,通过微分滤波器的实验说明了这种误差修正法的潜力。
In this paper, various errors of electron beam lithography for hologram fabrication are analyzed. A method of scanning the rectangular grating to measure the error is proposed and corrected by setting the error correction program. Finally, the experiment of differential filter shows the potential of this error correction method.