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根据对大量f电子组元素配合物与金属有机化合物结构空间堆积的计算,提出在这一领域中,存在成键作用与空间堆积作用的平衡.平衡区间的空间堆积程度以SAS 表示为:U(Ⅵ)0.90;An(Ⅳ)0.81;Ln(Ⅲ)(配合物)0.78;Ln(Ⅲ)(金属有机化合物)0.73.f 电子组元素配合物与会属有机化合物在以上述稳定值为中心,以一个通常配位体的立体角系数0.10为边界的临界区域内稳定.这个规律称作堆积饱和规律.
According to the calculation of the accumulation of a large number of f-electron group complexes and the metal-organic compound structure space, it is proposed that there is a balance between the bonding effect and space accumulation in this field. The degree of space accumulation in the balance interval is represented by SAS as U Ⅵ) 0.90; An (Ⅳ) 0.81; Ln (Ⅲ) (complex) 0.78; Ln (Ⅲ) (organometallic compound) 0.73.f The electron group element complex and the organic compound of interest belong to the above- The solid angle coefficient of a typical ligand, 0.10, is the critical region of the boundary, which is called the law of packing saturation.