本实验用对向靶溅射仪分别在Si（100），NaCl单晶衬底上成功地制备出具有高炮和磁化强度的（Fe，Ti）－N薄膜，研究了氮气分压和衬底温度对薄膜结构与磁性的影响。氮气分压为0．04～0．07Pa，衬底温度为100～150℃时，有利于Fe_(16)N_2相的形成，在此条件下制备的（Fe，Ti）－N薄膜的饱和磁化强度为2．3～2．46T，超过纯Fe的饱和磁化强度值。 In this experiment, (Fe, Ti) -N thin films with antiaircraft and magnetizing strength were successfully prepared on Si (100) and NaCl single crystal substrates by using a counter sputtering system. The effects of nitrogen partial pressure and substrate Effect of Temperature on the Structure and Magnetism of Thin Films. The partial pressure of nitrogen gas is 0.04 ~ 0.07Pa, and the substrate temperature is 100 ~ 150 ℃, which is favorable for the formation of Fe_ (16) N_2 phase. The saturation magnetization of (Fe, Ti) -N thin films prepared under these conditions The intensity is 2.3 ~ 2.46T, which exceeds the saturation magnetization value of pure Fe.