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采用多弧离子镀技术,在硅基体表面沉积TiAlN薄膜;固定试样与靶材间的距离,使试样表面与靶平面成0°、45°、60°、120°、135°、180°,研究偏转角度对薄膜表面质量的影响;固定试样与靶材的偏转角度(60°和120°),研究试样与靶材的距离(分别为240,265,295,325,350mm)对TiAlN薄膜质量的影响。采用三维白光干涉表面形貌仪、场发射环境扫描电子显微镜测试薄膜的表面粗糙度、表面形貌和厚度。结果表明:试样与靶材的偏转角度显著影响薄膜表面大颗粒的数量,而试样与靶材的距离则影响薄膜的厚度。TiAlN薄膜表面大颗粒物随偏转角度的增加明显减少,厚度随着试样与靶材距离的增加而减小。从靶材材料成分及蒸发出的粒子的分布、偏压电场下粒子的运动特性等方面讨论了基体和靶材的距离、偏转角度对薄膜沉积速率和大颗粒的影响机制。
The multi-arc ion plating technique is used to deposit the TiAlN film on the surface of the silicon substrate; the distance between the sample and the target is fixed so that the surface of the sample forms 0 °, 45 °, 60 °, 120 °, 135 ° and 180 ° with the target plane The influence of the deflection angle on the film surface quality was studied. The deflection angles (60 ° and 120 °) of the sample and the target were fixed. The influence of the distance between the sample and the target (240, 265, 295, 325 and 350 mm, respectively) on the quality of the TiAlN thin film was studied. The surface roughness, surface morphology and thickness of the film were measured by three-dimensional white light interference surface profilometer and field emission environment scanning electron microscope. The results show that the deflection angle between the sample and the target significantly affects the amount of large particles on the surface of the film, while the distance between the sample and the target affects the thickness of the film. The large particles on the surface of TiAlN thin films decrease with the increase of the deflection angle, and the thickness decreases with the increase of the distance between the sample and the target. The effects of the distance between the target and the target and the deflection angle on the film deposition rate and large particles are discussed based on the composition of the target material, the distribution of the evaporated particles and the movement characteristics of the particles under the bias electric field.