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《中国科技信息》2004年19期报道:光刻领域目前大热点是沉浸(immersion)技术。但美国亚利桑那大学的研究人员发明了所谓的“固体沉浸”(Solid immersion)技术,在光掩膜技术的Bacus研讨会上发表的论文中,预计该大学将描绘通过采用“固体沉浸透镜纳米探针”使无掩膜光刻成为现实的方法。
“China Science and Technology Information” 2004Year 19 report: the current hot spot in lithography is immersion (immersion) technology. But researchers at the University of Arizona in the United States invented the so-called “Solid Immersion” technique. In a paper published at the Bacus Symposium on Photomask Technology, it is expected that the university will describe the use of a “Solid Immersion Lens Nanoprobe ”makes maskless lithography a reality.