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采用射频磁控溅射在石英基底上制备Al_2O_3:Er~(3+)/Yb~(3+)薄膜,在其表面采用直流磁控溅射沉积纳米Ag薄膜。上转换发光测试表明在491和678 nm的发射峰出现了5.8倍和5.2倍的增强。X射线衍射、原子力显微镜以及透射﹑吸收和散射光谱表明:491 nm发射增强主要源于局域表面等离子或表面等离子与发射带的共振耦合辐射机制,而678 nm发射增强主要源于纳米Ag膜对荧光的LSP散射机制。
The Al_2O_3: Er ~ (3 +) / Yb ~ (3 +) thin films were prepared on the quartz substrate by RF magnetron sputtering, and the nano Ag films were deposited on the surface by DC magnetron sputtering. The up-conversion luminescence test showed that the emission peaks at 491 and 678 nm showed 5.8-fold and 5.2-fold enhancement. X-ray diffraction, atomic force microscopy, and transmission, absorption and scattering spectra show that the emission enhancement at 491 nm is mainly due to the resonance coupled radiation mechanism of the localized surface plasmon or surface plasmon with the emission band, while the emission enhancement at 678 nm is mainly due to the nano Ag film pair Fluorescent LSP scattering mechanism.