介绍了氧化锌材料的一些突出特性以及生长氧化锌的方法。并通过金属有机化学气相沉积 (MOCVD)方法制备了优良的氧化锌薄膜。使用X射线衍射 (XRD)谱和室温光致发光(PL)光谱对所生长氧化锌薄膜的晶体质量和光学特性进行了研究。X射线衍射谱图显示仅在2θ =34.72°处有一个很陡峭的ZnO (0 0 2 )晶面衍射峰 ,说明所制备的氧化锌薄膜c轴取向高度一致。此衍射峰的半高宽为 0 .2 82° ,显示出较好的晶体质量。在室温光致发光谱中 ,薄膜的紫外发光强度与深能级复合发光的强度比超过 10∶1,表明薄膜的光学质量较高 Some prominent features of zinc oxide materials and methods of growing zinc oxide are introduced. An excellent zinc oxide thin film was prepared by metal organic chemical vapor deposition (MOCVD). The crystal quality and optical properties of the as-grown ZnO thin films were investigated using X-ray diffraction (XRD) and room temperature photoluminescence (PL) spectroscopy. The X-ray diffraction pattern shows that there is a very steep diffraction peak of ZnO (0 0 2) at 2θ = 34.72 °, which indicates that the c-axis orientation of the prepared zinc oxide films is highly consistent. The FWHM of this diffraction peak is 0.222 °, which shows better crystal quality. In the room temperature photoluminescence spectra, the ratio of the intensity of ultraviolet light to that of deep-level compound luminescence is over 10: 1, indicating that the optical quality of the film is high