Scaling relation of domain competition on(2+1)-dimensional ballistic deposition model with surface d

来源 :Journal of Semiconductors | 被引量 : 0次 | 上传用户:zjubaoli
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During heteroepitaxial overlayer growth multiple crystal domains nucleated on a substrate surface compete with each other in such a manner that a domain covered by neighboring ones stops growing.The number density of active domains ρ decreases as the height h increases.A simple scaling argument leads to a scaling law of ρ~ h~(-γ) with a coarsening exponent γ=d/z,where d is the dimension of the substrate surface and z the dynamic exponent of a growth front.This scaling relation is confirmed by performing kinetic Monte Carlo simulations of the ballistic deposition model on a two-dimensional(d=2) surface,even when an isolated deposited particle diffuses on a crystal surface. During heteroepitaxial overlayer growth multiple crystal domains nucleated on a substrate surface compete with each other in such a manner that a domain covered byiates ones stops growing. The number density of active domains ρ decreases as the height h increases. A simple scaling argument leads to a scaling law of ρ ~ h ~ (-γ) with a coarsening exponent γ = d / z, where d is the dimension of the substrate surface and z the dynamic exponent of a growth front.This scaling relation is confirmed by performing kinetic Monte Carlo simulations of the ballistic deposition model on a two-dimensional (d = 2) surface, even when an isolated deposited particle diffuses on a crystal surface.
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