揭开大规模集成电路序幕的1K位金属—氧化物—半导体随机存取存储器占领市场以来,已经过了十个年头。可以说,一九八○年也是回顾这十年中各项技术的发展变化的重要时刻。在这十年之间,大规模集成电路器件技术,工艺技术一直在稳步地发展着,出现了目前这样的集成密度,加工精度和大量生产的产品。 例如,在集成度方面,由原来的1K位器件达到了64K位水平,最窄加工条宽 It has been ten years since the 1K-bit Metal-Oxide-Semiconductor random access memory, which unveiled the prelude to large scale integrated circuits, has dominated the market. It can be said that the year 1980 is also an important time to review the development and changes of various technologies in the past decade. During these ten years, large-scale integrated circuit device technology, process technology has been steadily developed, there has been such a current integration density, processing accuracy and mass-produced products. For example, in terms of integration, from the original 1K-bit device reached the level of 64K, the narrowest processing width