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概述了离子注入、离子束沉积、等离子喷涂、离子镀、等离子体增强化学气相沉积、等离子体化学热处理和双层辉光离子渗金属等等离子体表面技术的基本原理和最新进展,并给出了部分典型实例。
The basic principle and latest development of plasma surface technology such as ion implantation, ion beam deposition, plasma spraying, ion plating, plasma enhanced chemical vapor deposition, plasma chemical heat treatment and double glow plasma infiltration metal are summarized. Some typical examples.