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用1.4kW_cwTEM_ooCO_2激光分解TiBr_4,使Ti淀积在不锈钢基体上。对膜的厚度和淀积速率作为TiBr_4的分蒸气压、辐射时间和室温的函数进行了研究。得到比用化学汽相淀积制作的纯Ti膜大两个数量级的淀积速率(190μm/h)。另外,用俄歇电子谱、扫描电
TiBr_4 was decomposed by laser with 1.4kW_cwTEM_ooCO_2 to deposit Ti on the stainless steel substrate. The thickness of the film and the deposition rate were studied as a function of the partial pressure of TiBr 4, irradiation time and room temperature. A deposition rate (190 [mu] m / h) two orders of magnitude larger than the pure Ti film produced by chemical vapor deposition was obtained. In addition, with Auger electron spectroscopy, scanning electricity