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对增强腔在大失谐光场原子光刻中的实现进行了详细的讨论 ,通过增强腔对激光光束的压缩和功率的增强可达到近共振原子光刻的要求。数值结果显示相对于近共振原子刻印结果 ,在增强腔下光束中心处沉积的原子条纹宽度将更细 ,为原子刻印提供了一种实现条纹精细度较高的新型方案。
The realization of enhanced cavities in atomic photon lithography is discussed in detail. The requirements of near-resonance atomic lithography can be achieved by enhancing the compression and power enhancement of the cavity to the laser beam. The numerical results show that the width of the atomic stripe deposited at the center of the enhanced cavity beam will be finer than that of near-resonance atomic imprinting, which provides a novel scheme for atomic imprinting to achieve high stripe fineness.