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磁控溅射镀膜后的ITO废靶 ,以及ITO靶材生产中产生的边角料、切屑、废品等是再生铟的主要原料。对废靶的还原 二次电解工艺进行了研究 ,并获得了工艺参数良好、回收率高、纯度为 99 993 %的金属铟产品
Magnetron Sputtering coated ITO waste target, as well as the ITO target material produced in the scrap, scrap, scrap, etc. are the main raw material for the regeneration of indium. The reduction secondary reduction process of spent target was studied, and the metal indium product with good process parameters, high recovery and 99 993% purity was obtained.