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光刻技术是推动集成电路制造业不断向前发展的关键技术 ,X射线光刻技术是下一代光刻技术的一种 ,具有产业化的应用前景。掩模技术是X射线光刻技术的难点 ,本文报告了国内利用同步辐射源的X射线掩模和光刻技术研究的最新进展
Lithography is a key technology to promote the continuous development of integrated circuit manufacturing. X-ray lithography is one of the next generation of lithography technologies with industrial application prospect. Mask technology is the difficult point of X-ray lithography. This paper reports the recent progress in the research of X-ray masks and lithography using synchrotron radiation sources