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采用离子束溅射沉积技术和溶胶-凝胶技术在K9基片上镀制了厚度相近的SiO2单层介质膜,用表面热透镜技术对两类膜层分别进行了热吸收及实时动态热畸变实验测试,结合散射光阈值测试及实验前后膜层的显微观测,对相同基底、相同膜层材料而采用不同方法镀制的光学膜层,发现化学膜的强激光损伤阈值远高于相应物理膜;从热力学响应及膜层特性差异的角度揭示了化学膜层的强激光损伤阈值远高于相应物理膜层的微观机理,即物理膜具有高吸收下的致密膜层快传导的基底热冲击效应,而化学膜则有低吸收下的疏松空隙填充慢传导的延缓效应,大量的实验数据及现象都证实了这一结论.
The SiO2 monolayer dielectric films with similar thickness were plated on K9 substrate by ion beam sputtering deposition technique and sol-gel technique, and the thermal absorption and the real-time dynamic thermal distortion experiment of the two kinds of films were respectively carried out by the surface thermal lens technology The results show that the threshold of strong laser damage of the chemical film is much higher than that of the corresponding physical film by using different methods of coating on the same substrate and the same film material From the perspective of the difference of thermodynamic response and film properties, it is revealed that the strong laser damage threshold of the chemical film is much higher than that of the corresponding physical film, that is, the thermal shock of the substrate , While the chemical membrane has a slow absorption effect of loosely filled gaps under slow absorption. A large number of experimental data and phenomena confirm this conclusion.