本文报导了从光学干涉图形来无损测定反射衬底上的薄膜厚度;介绍了TR等新处理方法,在几百埃到十微米的厚度范围内,显示了简捷可靠的优点。讨论了外延材料光学干涉图形的位置、形状与其杂质截面分布之间的关系,还提出了光学测定多重薄膜厚度的可能性。 This paper reports on the non-destructive determination of film thickness on a reflective substrate from optical interference patterns; introduces new processing methods such as TR, which demonstrate the simplicity and reliability advantages over the thickness range of a few hundred angstroms to ten microns. The relationship between the position and the shape of the optical interference pattern of the epitaxial material and the distribution of the impurity cross section is discussed. The possibility of optically measuring the thickness of the multiple thin film is also proposed.