论文部分内容阅读
采用磁过滤阴极真空弧沉积技术在不同的真空室压强(N2流量)状态下制备TiAlN薄膜,讨论了N2流量对TiAlN薄膜各项性能的影响。并对薄膜的成分、结构和性能进行了测试。测试结果表明:获得薄膜较好,真空室压强对薄膜的厚度、摩擦系数和纳米硬度都有着重要的影响。
The TiAlN thin films were prepared under different vacuum chamber pressure (N2 flow rate) by using the magnetic filtration cathode vacuum arc deposition technology. The effects of N2 flow rate on the properties of the TiAlN thin films were discussed. The composition, structure and properties of the films were tested. The test results show that the obtained film is better and the pressure in the vacuum chamber has an important influence on the film thickness, friction coefficient and nano-hardness.