利用脉冲高能量密度等离子体技术在室温条件下在 4 5号钢基材上制备出了超硬耐磨TiN薄膜 .利用XRD ,XPS ,AES ,SEM等手段分析了薄膜的成分及显微组织结构 ,并测试了薄膜的硬度分布及摩擦磨损性能 .结果表明 :薄膜主要组成相为TiN ,薄膜组织致密、均匀 ,与基材之间存在较宽的混合界面 ;薄膜硬度高 ,在干滑动磨损实验条件下具有优异的耐磨性及较低的摩擦系数 Ultra-hard and wear-resistant TiN thin films were prepared on steel substrate No. 4 at room temperature by pulsed high energy density plasma technique.The composition and microstructure of the films were analyzed by means of XRD, XPS, AES and SEM , And the hardness distribution and friction and wear properties of the film were tested.The results show that the main phase of the film is TiN, the film is dense and uniform, and there is a wide mixing interface between the film and the substrate. Under the conditions of excellent wear resistance and low coefficient of friction